
Energy consumption has been a major factor in crypto mining from its beginning. No matter the scale of mining, energy costs will always be of great importance. Samsung Foundry has just launched the production of a brand new 7-nanometer (nm) Low Power Plus (7LPP) process node. This node will be able to drastically reduce energy consumption by up to 50%.
According to the press release, this revolutionary new process will be based on the extreme ultraviolet lithography technology. The EUV technology will allow the new chips to be both faster and more energy efficient. With the new EUV technology being implemented, the miners using Samsung hardware have a reason to celebrate. The implications are huge since energy consumption and therefore costs, have also been a huge issue for the industry’s profitability.
Samsung brings another innovation to the table
An inevitable process, which follows hardware and technology development in general is the growth of efficiency. As technology progresses, it’s paramount that parts become smaller and more efficient. This is an even bigger requirement for chips. Back in April, Samsung manufactured the 10nm hardware for the DragonMint T1 for Halong Mining. The 7LPP chip with the EUV technology is a huge leap for Samsung Foundry’s tech development.
This “little” advancement can pave the way for the long-awaited 3nm technology node semiconductor manufacturing. According to Samsung, the 7LPP will open the way for a huge technological development in the realm of Artificial Intelligence (AI), the Internet of Things (IoT), networking, 5G and enterprise and hyperscale datacenter.
The new 7LPP manufacturing technology will have its first users shortly. While no names have been revealed officially from Samsung, it’s heavily noted that the chips using the new technology will target mobile and high performance computing applications (HPC). By all accounts this is a huge step for the semiconductor industry. The new EUV-based 7LPP node will be an optimal choice not only for mobile and HPC, but also for a huge variety of the newest applications.
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